Chemical Vapor Deposition Reactor
Thu, 16 Jun 2011 01:06:37 -0500
Close-up of the deposition chamber of a chemical vapor deposition reactor used to deposit a compositional spread of metal oxides (TiO2, SnO2 and HfO2). Each of the individual precursors (anhydrous titanium, tin and hafnium nitrate) are sprayed from one of the three ...
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